On temperature planarization effect of copper dummy fills in deep nanometer technology

Basab Datta, Wayne Burleson. On temperature planarization effect of copper dummy fills in deep nanometer technology. In 10th International Symposium on Quality of Electronic Design (ISQED 2009), 16-18 March 2009, San Jose, CA, USA. pages 494-499, IEEE, 2009. [doi]

Abstract

Abstract is missing.