Redundant via insertion for multiple-patterning directed-self-assembly lithography

Seongbo Shim, Woohyun Chung, Youngsoo Shin. Redundant via insertion for multiple-patterning directed-self-assembly lithography. In Proceedings of the 53rd Annual Design Automation Conference, DAC 2016, Austin, TX, USA, June 5-9, 2016. pages 41, ACM, 2016. [doi]

Abstract

Abstract is missing.