Jian Kuang 0001, Evangeline F. Y. Young. Overlapping-aware throughput-driven stencil planning for E-beam lithography. In Yao-Wen Chang, editor, The IEEE/ACM International Conference on Computer-Aided Design, ICCAD 2014, San Jose, CA, USA, November 3-6, 2014. pages 254-261, IEEE/ACM, 2014. [doi]
Abstract is missing.