Use of lithography simulation for the calibration of equation-based design rule checks

David Abercrombie, Fedor Pikus, Cosmin Cazan. Use of lithography simulation for the calibration of equation-based design rule checks. In Proceedings of the 46th Design Automation Conference, DAC 2009, San Francisco, CA, USA, July 26-31, 2009. pages 67-70, ACM, 2009. [doi]

Abstract

Abstract is missing.