Mohamed Baker Alawieh, David Z. Pan. ADAPT: An Adaptive Machine Learning Framework with Application to Lithography Hotspot Detection. In 3rd ACM/IEEE Workshop on Machine Learning for CAD, MLCAD 2021, Raleigh, NC, USA, August 30 - Sept. 3, 2021. pages 1-6, IEEE, 2021. [doi]
Abstract is missing.