Epitaxial Gd2O3on Si (111) Substrate by Sputtering to Enable Low Cost SOI

K. R. Khiangte Amlta, A. Laha, S. Mahapatra, U. Gangway. Epitaxial Gd2O3on Si (111) Substrate by Sputtering to Enable Low Cost SOI. In 76th Device Research Conference, DRC 2018, Santa Barbara, CA, USA, June 24-27, 2018. pages 1-2, IEEE, 2018. [doi]

Abstract

Abstract is missing.