Daniel Arumí, Rosa Rodríguez-Montañés, Joan Figueras, Stefan Eichenberger, Camelia Hora, Bram Kruseman. Gate Leakage Impact on Full Open Defects in Interconnect Lines. IEEE Trans. VLSI Syst., 19(12):2209-2220, 2011. [doi]
@article{ArumiMFEHK11,
title = {Gate Leakage Impact on Full Open Defects in Interconnect Lines},
author = {Daniel Arumí and Rosa Rodríguez-Montañés and Joan Figueras and Stefan Eichenberger and Camelia Hora and Bram Kruseman},
year = {2011},
doi = {10.1109/TVLSI.2010.2077315},
url = {http://dx.doi.org/10.1109/TVLSI.2010.2077315},
researchr = {https://researchr.org/publication/ArumiMFEHK11},
cites = {0},
citedby = {0},
journal = {IEEE Trans. VLSI Syst.},
volume = {19},
number = {12},
pages = {2209-2220},
}