A fast manufacturability aware Optical Proximity Correction (OPC) algorithm with adaptive wafer image estimation

Ahmed Awad, Atsushi Takahashi 0001, Chikaaki Kodama. A fast manufacturability aware Optical Proximity Correction (OPC) algorithm with adaptive wafer image estimation. In Luca Fanucci, Jürgen Teich, editors, 2016 Design, Automation & Test in Europe Conference & Exhibition, DATE 2016, Dresden, Germany, March 14-18, 2016. pages 49-54, IEEE, 2016. [doi]

Abstract

Abstract is missing.