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Conformal and Ultra Shallow Junction Formation Achieved Using a Pulsed-Laser Annealing Process Integrated With a Modified Plasma Assisted Doping Method

Seunghun Baik, Dong-Jae Kwon, Hongki Kang, Jae Eun Jang, Jaewon Jang, Y. S. Kim, Hyuk-jun Kwon. Conformal and Ultra Shallow Junction Formation Achieved Using a Pulsed-Laser Annealing Process Integrated With a Modified Plasma Assisted Doping Method. IEEE Access, 8:172166-172174, 2020. [doi]

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