Trong Huynh Bao, Anabela Veloso, Sushil Sakhare, Philippe Matagne, Julien Ryckaert, Manu Perumkunnil, Davide Crotti, Farrukh Yasin, Alessio Spessot, Arnaud Furnemont, Gouri Sankar Kar, Anda Mocuta. Process, Circuit and System Co-optimization of Wafer Level Co-Integrated FinFET with Vertical Nanosheet Selector for STT-MRAM Applications. In Proceedings of the 56th Annual Design Automation Conference 2019, DAC 2019, Las Vegas, NV, USA, June 02-06, 2019. pages 13, ACM, 2019. [doi]
@inproceedings{BaoVSMRPCYSFKM19,
title = {Process, Circuit and System Co-optimization of Wafer Level Co-Integrated FinFET with Vertical Nanosheet Selector for STT-MRAM Applications},
author = {Trong Huynh Bao and Anabela Veloso and Sushil Sakhare and Philippe Matagne and Julien Ryckaert and Manu Perumkunnil and Davide Crotti and Farrukh Yasin and Alessio Spessot and Arnaud Furnemont and Gouri Sankar Kar and Anda Mocuta},
year = {2019},
doi = {10.1145/3316781.3317886},
url = {https://doi.org/10.1145/3316781.3317886},
researchr = {https://researchr.org/publication/BaoVSMRPCYSFKM19},
cites = {0},
citedby = {0},
pages = {13},
booktitle = {Proceedings of the 56th Annual Design Automation Conference 2019, DAC 2019, Las Vegas, NV, USA, June 02-06, 2019},
publisher = {ACM},
isbn = {978-1-4503-6725-7},
}