Impact and optimization of lithography-aware regular layout in digital circuit design

Vinícius Dal Bem, Paulo F. Butzen, Felipe S. Marranghello, André Inácio Reis, Renato P. Ribas. Impact and optimization of lithography-aware regular layout in digital circuit design. In IEEE 29th International Conference on Computer Design, ICCD 2011, Amherst, MA, USA, October 9-12, 2011. pages 279-284, IEEE, 2011. [doi]

Abstract

Abstract is missing.