Breakdown spots of ultra-thin (EOT<1.5nm) HfO::2::/SiO::2:: stacks observed with enhanced - CAFM

X. Blasco, M. Nafría, X. Aymerich, J. Pétry, Wilfried Vandervorst. Breakdown spots of ultra-thin (EOT<1.5nm) HfO::2::/SiO::2:: stacks observed with enhanced - CAFM. Microelectronics Reliability, 45(5-6):811-814, 2005. [doi]

Abstract

Abstract is missing.