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Breakdown spots of ultra-thin (EOT<1.5nm) HfO::2::/SiO::2:: stacks observed with enhanced - CAFM

X. Blasco, M. Nafría, X. Aymerich, J. Pétry, Wilfried Vandervorst. Breakdown spots of ultra-thin (EOT<1.5nm) HfO::2::/SiO::2:: stacks observed with enhanced - CAFM. Microelectronics Reliability, 45(5-6):811-814, 2005. [doi]

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