The following publications are possibly variants of this publication:
- Investigation of the Impact of Ferroelectricity Boosted Gate Stacks for 3D NAND on Short Time Data Retention and EnduranceYusuke Higashi, J. P. Bastos, Adrian Vaisman Chasin, Laurent Breuil, Antonio Arreghini, S. Ramesh, S. Rachidi, Y. Jeong, Geert Van den bosch, Maarten Rosmeulen. irps 2024: 1-6 [doi]
- Gate Stack Optimization Toward Disturb-Free Operation of Ferroelectric HSO based FeFET for NAND ApplicationsK. Seidel, K. Biedermann, J. Van Houdt, T. Ali, R. Hoffmann, K. Kühnel, M. Czernohorsky, M. Rudolph, B. Pätzold, P. Steinke, K. Zimmermann. nvmts 2019: 1-4 [doi]