The die-to-die calibrated combined model of negative bias temperature instability and gate oxide breakdown from device to system - researchr publication

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Soonyoung Cha, Dae-Hyun Kim, Taizhi Liu, Linda S. Milor. The die-to-die calibrated combined model of negative bias temperature instability and gate oxide breakdown from device to system. Microelectronics Reliability, 55(9-10):1404-1411, 2015. [doi]

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