Future electron-beam lithography and implications on design and CAD tools

Jack J. H. Chen, Faruk Krecinic, Jen-Hom Chen, Raymond P. S. Chen, Burn J. Lin. Future electron-beam lithography and implications on design and CAD tools. In Proceedings of the 16th Asia South Pacific Design Automation Conference, ASP-DAC 2011, Yokohama, Japan, January 25-27, 2011. pages 403-404, IEEE, 2011. [doi]

Abstract

Abstract is missing.