The effect of process variation on device temperature in FinFET circuits

Jung Hwan Choi, Jayathi Murthy, Kaushik Roy. The effect of process variation on device temperature in FinFET circuits. In Georges G. E. Gielen, editor, 2007 International Conference on Computer-Aided Design (ICCAD 07), November 5-8, 2007, San Jose, CA, USA. pages 747-751, IEEE, 2007. [doi]

Abstract

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