Rationales for Holonic Applications in Chemical Process Industries

Nirav Navinchandra Chokshi, Duncan C. McFarlane. Rationales for Holonic Applications in Chemical Process Industries. In Vladimír Marík, Olga Stepánková, Hana Krautwurmova, Michael Luck, editors, Multi-Agent-Systems and Applications II, 9th ECCAI-ACAI/EASSS 2001, AEMAS 2001, HoloMAS 2001, Selected Revised Papers. Volume 2322 of Lecture Notes in Computer Science, pages 336-350, Springer, 2001. [doi]

Abstract

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