Reversible dielectric breakdown in ultrathin Hf based high-k stacks under current-limited stresses

A. Crespo-Yepes, J. Martín-Martínez, R. Rodríguez, M. Nafría, X. Aymerich. Reversible dielectric breakdown in ultrathin Hf based high-k stacks under current-limited stresses. Microelectronics Reliability, 49(9-11):1024-1028, 2009. [doi]

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