Through Glass Vias by Wet-etching Process in 49% HF Solution Using an AZ4620 Enhanced Cr/Au Mask

Guang-Hui Ding, Binghe Ma, Yu-Chao Yan, Weizheng Yuan, Jinjun Deng, Jian Luo. Through Glass Vias by Wet-etching Process in 49% HF Solution Using an AZ4620 Enhanced Cr/Au Mask. In 16th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2021, Xiamen, China, April 25-29, 2021. pages 872-875, IEEE, 2021. [doi]

Abstract

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