The Resistance to Label Noise in K-NN and DNN Depends on its Concentration

Amnon Drory, Oria Ratzon, Shai Avidan, Raja Giryes. The Resistance to Label Noise in K-NN and DNN Depends on its Concentration. In 31st British Machine Vision Conference 2020, BMVC 2020, Virtual Event, UK, September 7-10, 2020. BMVA Press, 2020. [doi]

Abstract

Abstract is missing.