Low frequency noise and reliability properties pf 0.12 mum CMOS devices with Ta::2::O::5:: as gate dielectrics

M. Fadlallah, A. Szewczyk, C. Giannakopoulos, B. Cretu, F. Monsieur, T. Devoivre, J. Jomaah, G. Ghibaudo. Low frequency noise and reliability properties pf 0.12 mum CMOS devices with Ta::2::O::5:: as gate dielectrics. Microelectronics Reliability, 41(9-10):1361-1366, 2001.

@article{FadlallahSGCMDJG01,
  title = {Low frequency noise and reliability properties pf 0.12 mum CMOS devices with Ta::2::O::5:: as gate dielectrics},
  author = {M. Fadlallah and A. Szewczyk and C. Giannakopoulos and B. Cretu and F. Monsieur and T. Devoivre and J. Jomaah and G. Ghibaudo},
  year = {2001},
  tags = {C++, reliability},
  researchr = {https://researchr.org/publication/FadlallahSGCMDJG01},
  cites = {0},
  citedby = {0},
  journal = {Microelectronics Reliability},
  volume = {41},
  number = {9-10},
  pages = {1361-1366},
}