Characterization of thin and ultra-thin SiO::2:: films and SiO::2::/Si interfaces with combined conducting and topographic atomic force microscopy

Werner Frammelsberger, Guenther Benstetter, Thomas Schweinboeck, Richard J. Stamp, Janice Kiely. Characterization of thin and ultra-thin SiO::2:: films and SiO::2::/Si interfaces with combined conducting and topographic atomic force microscopy. Microelectronics Reliability, 43(9-11):1465-1470, 2003. [doi]

Abstract

Abstract is missing.