Modeling the Effect of Global Layout Pattern on Wire Width Variation for On-the-Fly Etching Process Modification

Daisuke Fukuda, Kenichi Watanabe, Yuji Kanazawa, Masanori Hashimoto. Modeling the Effect of Global Layout Pattern on Wire Width Variation for On-the-Fly Etching Process Modification. IEICE Transactions, 98-A(7):1467-1474, 2015. [doi]

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