Zhen Geng, Zheng Shi, Xiaolang Yan, Kai-sheng Luo. A New Level-Set-Based Inverse Lithography Algorithm for Process Robustness Improvement with Attenuated Phase Shift Mask. In 2013 International Conference on Computer-Aided Design and Computer Graphics, CAD/Graphics 2013, Guangzhou, China, November 16-18, 2013. pages 68-73, IEEE, 2013. [doi]
Abstract is missing.