Electromagnetic Metrology for Nano- Electromechanical Systems

Ling Hao, John C. Gallop, Jie Chen 0016. Electromagnetic Metrology for Nano- Electromechanical Systems. IEEE T. Instrumentation and Measurement, 68(6):1827-1832, 2019. [doi]

@article{HaoGC19,
  title = {Electromagnetic Metrology for Nano- Electromechanical Systems},
  author = {Ling Hao and John C. Gallop and Jie Chen 0016},
  year = {2019},
  doi = {10.1109/TIM.2018.2879068},
  url = {https://doi.org/10.1109/TIM.2018.2879068},
  researchr = {https://researchr.org/publication/HaoGC19},
  cites = {0},
  citedby = {0},
  journal = {IEEE T. Instrumentation and Measurement},
  volume = {68},
  number = {6},
  pages = {1827-1832},
}