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Technostress and Multiple Organizational Social Media - Investigating Negative and Positive Stressors and Strains from a Person-Technology-Fit Perspective

Karin Högberg. Technostress and Multiple Organizational Social Media - Investigating Negative and Positive Stressors and Strains from a Person-Technology-Fit Perspective. In 54th Hawaii International Conference on System Sciences, HICSS 2021, Kauai, Hawaii, USA, January 5, 2021. pages 1-10, ScholarSpace, 2021. [doi]

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