Comparison of deposition models for a TEOS LPCVD process

Stefan Holzer, Alireza Sheikholeslami, Markus Karner, Tibor Grasser, Siegfried Selberherr. Comparison of deposition models for a TEOS LPCVD process. Microelectronics Reliability, 47(4-5):623-625, 2007. [doi]

Abstract

Abstract is missing.