High-Rate Oblique Deposition of SiO::2:: Films Using Two Sputtering Sources

Yoichi Hoshi, Kensuke Yagi, Eisuke Suzuki, Hao Lei, Akira Sakai. High-Rate Oblique Deposition of SiO::2:: Films Using Two Sputtering Sources. IEICE Transactions, 91-C(10):1644-1648, 2008. [doi]

Abstract

Abstract is missing.