Investigation on negative capacitance FinEFT beyond 7 nm node from device to circuit

Jiali Huo, Weixing Huang, Fan Zhang, Shengli Zhang, Weizhuo Gan, Qiang Huo, Yuwei Cai, Qingzhu Zhang, Yongliang Li, Huilong Zhu, Huaxiang Yin, Zhenhua Wu. Investigation on negative capacitance FinEFT beyond 7 nm node from device to circuit. Microelectronics Journal, 116:105196, 2021. [doi]

Abstract

Abstract is missing.