Optimal wiring topology for electromigration avoidance considering multiple layers and obstacles

Iris Hui-Ru Jiang, Hua-Yu Chang, Chih-Long Chang. Optimal wiring topology for electromigration avoidance considering multiple layers and obstacles. In Prashant Saxena, Yao-Wen Chang, editors, Proceedings of the 2010 International Symposium on Physical Design, ISPD 2010, San Francisco, California, USA, March 14-17, 2010. pages 177-184, ACM, 2010. [doi]

Abstract

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