Joo-Hyung Kim, Jung Joo Kim, Chang-Eun Lee, Jong-Ho Lee, Dong-Seok Kim, Nam Joo Kim, Kwang Dong Yoo, Heung-Soo Park. Fluorine improvement of MOSFET interface as revealed by RTS measurements and HRTEM. In 2013 IEEE Radio and Wireless Symposium, Austin, TX, USA, January 20-23, 2013. pages 97-99, IEEE, 2013. [doi]
@inproceedings{KimKLLKKYP13, title = {Fluorine improvement of MOSFET interface as revealed by RTS measurements and HRTEM}, author = {Joo-Hyung Kim and Jung Joo Kim and Chang-Eun Lee and Jong-Ho Lee and Dong-Seok Kim and Nam Joo Kim and Kwang Dong Yoo and Heung-Soo Park}, year = {2013}, doi = {10.1109/RWS.2013.6486653}, url = {http://dx.doi.org/10.1109/RWS.2013.6486653}, researchr = {https://researchr.org/publication/KimKLLKKYP13}, cites = {0}, citedby = {0}, pages = {97-99}, booktitle = {2013 IEEE Radio and Wireless Symposium, Austin, TX, USA, January 20-23, 2013}, publisher = {IEEE}, isbn = {978-1-4673-2929-3}, }