Fluorine improvement of MOSFET interface as revealed by RTS measurements and HRTEM

Joo-Hyung Kim, Jung Joo Kim, Chang-Eun Lee, Jong-Ho Lee, Dong-Seok Kim, Nam Joo Kim, Kwang Dong Yoo, Heung-Soo Park. Fluorine improvement of MOSFET interface as revealed by RTS measurements and HRTEM. In 2013 IEEE Radio and Wireless Symposium, Austin, TX, USA, January 20-23, 2013. pages 97-99, IEEE, 2013. [doi]

@inproceedings{KimKLLKKYP13,
  title = {Fluorine improvement of MOSFET interface as revealed by RTS measurements and HRTEM},
  author = {Joo-Hyung Kim and Jung Joo Kim and Chang-Eun Lee and Jong-Ho Lee and Dong-Seok Kim and Nam Joo Kim and Kwang Dong Yoo and Heung-Soo Park},
  year = {2013},
  doi = {10.1109/RWS.2013.6486653},
  url = {http://dx.doi.org/10.1109/RWS.2013.6486653},
  researchr = {https://researchr.org/publication/KimKLLKKYP13},
  cites = {0},
  citedby = {0},
  pages = {97-99},
  booktitle = {2013 IEEE Radio and Wireless Symposium, Austin, TX, USA, January 20-23, 2013},
  publisher = {IEEE},
  isbn = {978-1-4673-2929-3},
}