Double-side exposure UV-LED CNC lithography for fine 3D microfabrication

Jungkwun Kim, Yong-Kyu Yoon, Mark G. Allen. Double-side exposure UV-LED CNC lithography for fine 3D microfabrication. In 12th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2017, Los Angeles, CA, USA, April 9-12, 2017. pages 463-466, IEEE, 2017. [doi]

Abstract

Abstract is missing.