Process Variation Aware Comprehensive Layout Synthesis for Yield Enhancement in Nano-meter CMOS

Kenichiro Kurihara, Tetsuya Iizuka, Makoto Ikeda, Kunihiro Asada. Process Variation Aware Comprehensive Layout Synthesis for Yield Enhancement in Nano-meter CMOS. In 14th IEEE International Conference on Electronics, Circuits, and Systems, ICECS 2007, Marrakech, Morocco, December 11-14, 2007. pages 1296-1299, IEEE, 2007. [doi]

Abstract

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