Influence of the manufacturing process on the electrical properties of thin (k stacks observed with CAFM

M. Lanza, M. Porti, M. Nafría, Guenther Benstetter, Werner Frammelsberger, H. Ranzinger, E. Lodermeier, G. Jaschke. Influence of the manufacturing process on the electrical properties of thin (k stacks observed with CAFM. Microelectronics Reliability, 47(9-11):1424-1428, 2007. [doi]

Authors

M. Lanza

This author has not been identified. It may be one of the following persons: Look up 'M. Lanza' in Google

M. Porti

This author has not been identified. Look up 'M. Porti' in Google

M. Nafría

This author has not been identified. Look up 'M. Nafría' in Google

Guenther Benstetter

This author has not been identified. Look up 'Guenther Benstetter' in Google

Werner Frammelsberger

This author has not been identified. Look up 'Werner Frammelsberger' in Google

H. Ranzinger

This author has not been identified. Look up 'H. Ranzinger' in Google

E. Lodermeier

This author has not been identified. Look up 'E. Lodermeier' in Google

G. Jaschke

This author has not been identified. Look up 'G. Jaschke' in Google