Large-scale atomistic approach to random-dopant-induced characteristic variability in nanoscale CMOS digital and high-frequency integrated circuits

Yiming Li, Chih-Hong Hwang, Ta-Ching Yeh, Tien-Yeh Li. Large-scale atomistic approach to random-dopant-induced characteristic variability in nanoscale CMOS digital and high-frequency integrated circuits. In Sani R. Nassif, Jaijeet S. Roychowdhury, editors, 2008 International Conference on Computer-Aided Design (ICCAD 08), November 10-13, 2008, San Jose, CA, USA. pages 278-285, IEEE, 2008. [doi]

@inproceedings{LiHYL08,
  title = {Large-scale atomistic approach to random-dopant-induced characteristic variability in nanoscale CMOS digital and high-frequency integrated circuits},
  author = {Yiming Li and Chih-Hong Hwang and Ta-Ching Yeh and Tien-Yeh Li},
  year = {2008},
  doi = {10.1145/1509456.1509524},
  url = {http://doi.acm.org/10.1145/1509456.1509524},
  tags = {systematic-approach},
  researchr = {https://researchr.org/publication/LiHYL08},
  cites = {0},
  citedby = {0},
  pages = {278-285},
  booktitle = {2008 International Conference on Computer-Aided Design (ICCAD 08), November 10-13, 2008, San Jose, CA, USA},
  editor = {Sani R. Nassif and Jaijeet S. Roychowdhury},
  publisher = {IEEE},
  isbn = {978-1-4244-2820-5},
}