Aluminum-photoresist dual-layer lift-off process for gold micropattern preparation in cellular researches

Yaoping Liu, Wei Wang, Chun Yang, Zhihong Li. Aluminum-photoresist dual-layer lift-off process for gold micropattern preparation in cellular researches. In 5th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2010, Xiamen, China, January 20-23, 2010. pages 297-300, IEEE, 2010. [doi]

Abstract

Abstract is missing.