Statistical and Corner Modeling of Interconnect Resistance and Capacitance

Ning Lu. Statistical and Corner Modeling of Interconnect Resistance and Capacitance. In Proceedings of the IEEE 2006 Custom Integrated Circuits Conference, CICC 2006, DoubleTree Hotel, San Jose, California, USA, September 10-13, 2006. pages 853-856, IEEE, 2006. [doi]

Abstract

Abstract is missing.