Researchr is a web site for finding, collecting, sharing, and reviewing scientific publications, for researchers by researchers.
Sign up for an account to create a profile with publication list, tag and review your related work, and share bibliographies with your co-authors.
Xu Ma, Zhiqiang Wang, Xuanbo Chen, Yanqiu Li, Gonzalo R. Arce. Gradient-Based Source Mask Optimization for Extreme Ultraviolet Lithography. IEEE Trans. Computational Imaging, 5(1):120-135, 2019. [doi]
Abstract is missing.