Saibal Mukhopadhyay, Keunwoo Kim, Jae-Joon Kim, Shih-Hsien Lo, Rajiv V. Joshi, Ching-Te Chuang, Kaushik Roy. Modeling and Analysis of Gate Leakage in Ultra-thin Oxide Sub-50nm Double Gate Devices and Circuits. In 6th International Symposium on Quality of Electronic Design (ISQED 2005), 21-23 March 2005, San Jose, CA, USA. pages 410-415, IEEE Computer Society, 2005. [doi]
Abstract is missing.