Equipment design and process control of critical dimensions in lithography

Yit Sung Ngo, Geng Yang, Andi S. Putra, Kar Tien Ang, Arthur Tay, Zhong Ping Fang. Equipment design and process control of critical dimensions in lithography. In 8th IEEE International Conference on Control and Automation, ICCA 2010, Xiamen, China, June 9-11, 2010. pages 1572-1577, IEEE, 2010. [doi]

Abstract

Abstract is missing.