R. Pagano, Salvatore Lombardo, F. Palumbo, P. Kirsch, S. A. Krishnan, C. Young, R. Choi, G. Bersuker, James H. Stathis. A novel approach to characterization of progressive breakdown in high-k/metal gate stacks. Microelectronics Reliability, 48(11-12):1759-1764, 2008. [doi]
Abstract is missing.