Nanolithography and CAD challenges for 32nm/22nm and beyond

David Z. Pan, Stephen Renwick, Vivek Singh, Judy Huckabay. Nanolithography and CAD challenges for 32nm/22nm and beyond. In Sani R. Nassif, Jaijeet S. Roychowdhury, editors, 2008 International Conference on Computer-Aided Design (ICCAD 08), November 10-13, 2008, San Jose, CA, USA. pages 6, IEEE, 2008. [doi]

Abstract

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