Gradient-Based Source and Mask Optimization in Optical Lithography

Yao Peng, Jinyu Zhang, Yan Wang, Zhiping Yu. Gradient-Based Source and Mask Optimization in Optical Lithography. IEEE Transactions on Image Processing, 20(10):2856-2864, 2011. [doi]

@article{PengZWY11,
  title = {Gradient-Based Source and Mask Optimization in Optical Lithography},
  author = {Yao Peng and Jinyu Zhang and Yan Wang and Zhiping Yu},
  year = {2011},
  doi = {10.1109/TIP.2011.2131668},
  url = {http://dx.doi.org/10.1109/TIP.2011.2131668},
  researchr = {https://researchr.org/publication/PengZWY11},
  cites = {0},
  citedby = {0},
  journal = {IEEE Transactions on Image Processing},
  volume = {20},
  number = {10},
  pages = {2856-2864},
}