Total ionizing dose response of fluorine implanted Silicon-On-Insulator buried oxide

Kenneth Potter, Katrina A. Morgan, Chris Shaw, Peter Ashburn, William Redman-White, C. H. De Groot. Total ionizing dose response of fluorine implanted Silicon-On-Insulator buried oxide. Microelectronics Reliability, 54(9-10):2339-2343, 2014. [doi]

Abstract

Abstract is missing.