Luminescent Silicon Oxycarbide Thin Films via Hot-wire CVD using Tetraethyl Orthosilicate: Role of the Chamber Pressure and Post-deposition Annealing

J. R. Ramos-Serrano, Y. Matsumoto, C. Morales. Luminescent Silicon Oxycarbide Thin Films via Hot-wire CVD using Tetraethyl Orthosilicate: Role of the Chamber Pressure and Post-deposition Annealing. In 15th International Conference on Electrical Engineering, Computing Science and Automatic Control, CCE 2018, Mexico City, Mexico, September 5-7, 2018. pages 1-4, IEEE, 2018. [doi]

Abstract

Abstract is missing.