A design platform for 90-nm leakage reduction techniques

Philippe Royannez, Hugh Mair, Franck Dahan, Mike Wagner, Mark Streeter, Laurent Bouetel, Joel Blasquez, H. Clasen, G. Semino, Julie Dong, D. Scott, B. Pitts, Claudine Raibaut, Uming Ko. A design platform for 90-nm leakage reduction techniques. In William H. Joyner Jr., Grant Martin, Andrew B. Kahng, editors, Proceedings of the 42nd Design Automation Conference, DAC 2005, San Diego, CA, USA, June 13-17, 2005. pages 549-550, ACM, 2005. [doi]

Abstract

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