Thomas Scherübl, Yael Sufrin, Avi Cohen, Ofir Sharoni, Rolf Seltmann. Excursion prevention and increasing device performance using mask correction for intrafield CD and Overlay improvement. In 49th European Solid-State Device Research Conference, ESSDERC 2019, Cracow, Poland, September 23-26, 2019. pages 57-60, IEEE, 2019. [doi]
Abstract is missing.