K. Seidel, K. Biedermann, J. Van Houdt, T. Ali, R. Hoffmann, K. Kühnel, M. Czernohorsky, M. Rudolph, B. Pätzold, P. Steinke, K. Zimmermann. Gate Stack Optimization Toward Disturb-Free Operation of Ferroelectric HSO based FeFET for NAND Applications. In 19th Non-Volatile Memory Technology Symposium, NVMTS 2019, Durham, NC, USA, October 28-30, 2019. pages 1-4, IEEE, 2019. [doi]
Abstract is missing.