Physical design and mask optimization for directed self-assembly lithography (DSAL)

Seongbo Shim, Youngsoo Shin. Physical design and mask optimization for directed self-assembly lithography (DSAL). In 2015 IFIP/IEEE International Conference on Very Large Scale Integration, VLSI-SoC 2015, Daejeon, South Korea, October 5-7, 2015. pages 80-85, IEEE, 2015. [doi]

Abstract

Abstract is missing.